For precise etching, cleaning and rinsing operations during semiconductor, ICB and PCB manufacturing, ANGUS offers an array of specialty, electronics-grade chemistries that deliver the high-performance functionality and compatibility formulators need for effective post-etch residue removal.
The tunability and chemical stability of ANGUS chemistries enable formulators to design chemical mechanical planarization (CMP) slurries with selective etching characteristics, while preserving the integrity of critical, multi-level circuitry. ANGUS chemistries facilitate the creation of highly uniform dispersions for achieving controlled levels of abrasion to selectively remove certain metals for creating ultra-smooth surfaces, helping to reduce defects and improve yields.
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- Highly efficient and chemically stable chemistries
- Multi-metal compatibility
- High water-solubility
- Facilitates highly uniform dispersions
- Improved EH&S profile and biodegradability
DID YOU KNOW?
The high volatility of certain ANGUS chemistries, such as VOLTAN™ 95, helps eliminate organic residues post processing, helping manufacturers to maximize productivity and yields.